Dr. Silva will be at the Oak Ridge National Laboratory, in Oak Ridge, Tennessee, for 3.5 months.

His project is dedicated to the study of the effects of externally and internally applied pressure on multifunctional materials, in particular on the R5(Si,Ge)4 family of compounds – worldwide known for being a topclass of magnetic refrigerants. There is a great lack of understanding on how high-pressures, affect their magnetic and structural properties. Hence, his plan is to apply high-pressures via two approaches: externally, with high-pressure cells applied on macroscopic R5(Si,Ge)4 and internally, by nanostructuring. The vast set of advanced materials characterization techniques of ORNL will be critical to unveil new properties arising under these conditions.